解婧

中国科学院微电子研究所

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  • 解婧
  • 副研究员
  • 北京市朝阳区北土城西路3号

简 历:

教育背景

2002.9 - 2006.7:清华大学,电子工程,学士

2006.9 - 2011.7:中国科学院半导体研究所,微电子学与固体电子学,博士

工作简历

2011.7 - 2014.12,中国科学院微电子研究所,助理研究员

2014.12 - 至今,中国科学院微电子研究所,副研究员

2015.9 - 至今,中国科学院大学,岗位教授

社会任职: 研究方向:

长期从事微纳材料、结构、及相关设备的研究工作。曾研制开发了Q值接近2.5万的射频MEMS点阻滤波器;作为02专项子课题“原子层薄膜沉积系统”课题执行组长,开发了国内首套8英寸ALD样机及相应的全套薄膜沉积工艺;并于此开展开放型合作,实现了专利成果转让、企业新产品开发及销售;作为国家重大科研仪器研制项目的首席设计师,开发亚10纳米结构原位制备、实时分析研究的大型UHV多系统集成装备,为下一代高性能器件研究提供技术支撑。已在相关领域国际期刊会议发表文章10余篇,授权发明专利20余项。

承担科研项目情况:

承担项目:重点研发计划(微纳生化)、院装备团队(SPM)、院装备(光谱仪)等项目课题负责人。基金重大仪器专项(2D材料及器件)、02专项(ALD)等项目研发负责人。

代表论著:

[1]. Zhang Yang, Dou Wei, Luo Wei, Lu Weier, Xie Jing*, Li Chaobo and Xia Yang, Large area graphene produced via the assistance of surface modification[J]. Journal of Semiconductors, 2013, 34(7):47-51.

[2]. Wei Luo, Jing Xie, Chaobo Li, Yang Zhang, and Yang Xia, High-precision thickness regulation of graphene layers with low energy helium plasma implantation.[J]. Nanotechnology, 2012, 23(37):1-6.

[3]. Wei Luo, Jing Xie, Yang Zhang, Chaobo Li and Yang Xia, Anodic bonding using a hybrid electrode with a two-step bonding process[J]. Journal of semiconductors, 2012, 33(6): 066001.

[4]. Yunfei Liu, Jing Xie, Hui Zhao, Wei Luo, Jinling Yang, Ji An and Fuhua Yang, An effective approach for restraining electrochemical corrosion of polycrystalline silicon caused by an HF-based solution and its application for mass production of MEMS devices[J]. Journal of Micromechanics and Microengineering, 2012, 22(3): 035003.

[5]. Jing Xie, Yunfei Liu, Mingliang Zhang, Jinling Yang, and Fuhua Yang, A simple method for effectively restrain electrochemical corrosion of polycrystalline silicon by HF-based solutions[C]. Micro Electro Mechanical Systems (MEMS), 2011 IEEE 24th International Conference on. IEEE, 2011: 205-208.

[6]. Jing Xie, Yunfei Liu, Hui Zhao, Jinling Yang, and Fuhua Yang, Reliable low-cost fabrication and characterization methods for micromechanical disk resonators[C]. 2011 16th International Solid-State Sensors, Actuators and Microsystems Conference. IEEE, 2011: 2462-2465.

[7]. Jing Xie, Yunfei Liu, Jinling Yang, Longjuan Tang, and Fuhua Yang, Stress and resistivity controls on in situ boron doped LPCVD polysilicon films for high-Q MEMS applications[J]. Journal of Semiconductors, 2009, 30(8):34-38.

[8]. Yunfei Liu, Jing Xie, Mingliang Zhang, Jinling Yang, and Fuhua Yang, An effective approach for restraining galvanic corrosion of polycrystalline silicon by hydrofluoric-acid-based solutions[J]. journal of Microelectromechanical systems, 2011, 20(2): 460-465.

[9]. Yunfei Liu, Jing Xie, Jinling Yang, Longjuan Tang, and Fuhua Yang, Liu Y, Xie J, Yang J, et al. In-situ boron-doped low-stress LPCVD polysilicon for micromechanical disk resonator[C]. Solid-State and Integrated-Circuit Technology, 2008. ICSICT 2008. 9th International Conference on. IEEE, 2008: 2387-2390.

[10]. Longjuan Tang, Yinfang Zhu, Jinling Yang, Yan Li, Wei Zhou, Jing Xie, Yunfei Liu and Fuhua Yang, Dependence of wet etch rate on deposition, annealing conditions and etchants for PECVD silicon nitride film[J]. Journal of Semiconductors, 2009, 30(9): 096005.

[11]. Lu, W., Dong, Y., Li, C., Xia, Y., Liu, B., & Xie, J., et al. Preparation of ZnO films with variable electric field-assisted atomic layer deposition technique[J]. Applied Surface Science, 2014, 303(6):111–117.

专利申请:

包含国际专利1项,授权专利25项

获奖及荣誉:

中国科学院教育教学成果奖特等奖